Physical Vapor Deposition is the technology which deposit materials on the workpiece by using physical method. And the main ways include Evaporative, Sputtering, and Ion Plating.

二. The technology of PVD coating

1. Evaporative

In a vacuum container, the material to be vaporized is heated to vaporization and sublimation, and the gas adheres to the surface of the substrate placed nearby to form a thin film.

2.Sputtering

The sputtering process is the technology that the target material is bombarded out by ion bombardment. Inert gas, such as argon, is charged into the vacuum cavity. By using high voltage, glow discharge is generated to accelerate the ion to the target surface. Argon ion bombards (sputters) the target material from the surface and deposits it on the workpiece in front of the target.

三. The feature of PVD coating film

1.High hardness, high wear resistance, and low friction coefficient

2.Good corrosion resistance, chemical stability

3.Longer lifespan

4.Significantly improve appearance and durability

四. Advantages of PVD coating

1.The thickness of PVD coating is about 0.8μm～2μm.

2.Does not affect the original size of the workpiece.

3.No need to process after plating

4.Free from pollution

5.Variety of PVD coating color

6.Good Adhesion, Hardness, and quality

7.Suitable for plating alloy materials

五.Comparison with PVD and Electroplating

	PVD	Electroplating
Adhesion	★★★★	★★★
Hardness	★★★★	★★
Surface smoothness	★★★	★★
Wearability	★★★★	★★
Corrosion resistance	★★★	★★
Performance of coating	★★★★	★
Environmental friendly	★★★★★